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PECVD Plasma Enhanced CVD Tube Furnace

product introduction：

PECVD tube furnace system(plasma enhanced chemical vapor depostion) is special euqipment for growth of high quality thin film on kinds of substrates.

Depostion temperature is adjustable from 100℃ to 1100℃,especially suitable for technology research of kinds of thin films in the laboratory.

Applicable for SiO2, SiNx ,, SiONx a-Si thin film deposition and diamond like carbon thin film depostion, at the same time the products can achieve TEOS source deposition, SiC film deposition, and other deposition liquid or gaseous source materials, especially for high efficiency protective layer film deposition of organic materials and no damage passivation film deposition under a specific temperature.

PECVD Plasma Enhanced CVD Tube Furnace System Introduction:

NBD-PECVD1200-80ITD2Z is a CE certified compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system which consists of 500W RF plasma source, 80mm optional split tube furnace, 2 channels precision mass flow meter with gas mixing tank, and high-quality mechanical pump. The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) to a solid state, and benefits:

Lower temperature processing compared to conventional CVD.
Film stress can be controlled by high/low frequency mixing techniques.
Control over stoichiometry via process conditions.
Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.

PECVD Plasma Enhanced CVD Tube Furnace System Application:

Plasma induced surface modification
Plasma cleaning
Plasma polymerization
A variety of films deposited on the surface of SiOx, SiNx, amorphous silicon, microcrystalline silicon, nano-silicon, SiC, DLC, etc.
selective growth of the carbon nanotubes (CNT)

PECVD Plasma Enhanced CVD Tube Furnace System Parameter:

Model: NBD-PECVD1200-80ITD2Z
Special screw dual reaction chamber system
Mechanical pumpwith control power
RF generator
Fully digital touch screen temperature control system
2 channel mass flow meter (three channel mass flow meter available)
PECVDdepostion: SiO2, SiNx ,, SiONx a-Si thin film deposition and diamond like carbon thin film depostion
uniformty deviation:≤ ± 4％ ( within 3inch)
working space: 3inch, 10pS
Sample size:2-3″
working temp: 100～1200℃
temperature control accuracy: ≤ ±1℃
Model: NBD-PECVD1200-80ITD2Z
Cleaning and coating RFpower: 20~200Wadjustable
Tube diameter: Φ80mm
Length of Heating zone: 200mm
Max temperature: 1200℃
Size: L1300xH1260xW820
Power:AC220V,4KW
Weight: 360kg

PECVD Plasma Enhanced CVD Tube Furnace System Working Principle:

PECVD Plasma Enhanced CVD Tube Furnace System Working Principle

PECVD tube furnace system

The gas is ionized and its activity is enhanced when gas goes through RF generator. After that gas moves to the heating temperature zone and deposit on the surface of the substrates.

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