Equipment introduction:

Chemical vapor deposition (CVD) refers to the reaction of chemical gases or vapors on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to deposit thin film materials, including a wide range of insulation materials, as well as most metal materials and metal alloy materials. To this end, we developed a complete set of CVD coating system, which is suitable for material laboratories, scientific research institutes, environmental science and other fields;

This equipment is customized based on customer requirements in the field of new energy. The reaction gases include inflammable and explosive, poisonous and harmful gases, and liquid gasification through the gas phase generator. Multi-channel mass flowmeter precisely controls intake volume. High precision pressure sensor, solenoid valve, gas detector, alarm and exhaust treatment tank, to ensure the safe, efficient and harmless discharge