The three temperature zone PECVD system, also known as the Plasma Enhanced Chemical Vapor Deposition (PECVD) system, is an advanced thin film deposition technology widely used in the semiconductor industry, microelectronics, optoelectronics, solar energy and other fields. The system converts the gas in the quartz vacuum chamber into an ionic state through an RF power supply, activates the reaction gas with high-energy electrons in the plasma, and causes it to undergo chemical reactions at lower temperatures, thereby depositing the required thin film on the substrate.