Equipment introduction：

Rapid Thermal Processing Furnace (RTP) not only has a very fast heating rate, but also directly moves the sample to room temperature after the completion of the sintering process to achieve rapid cooling under the physical state. The equipment adopts the air path structure of inner tube inlet and outer tube outlet, which makes the reaction atmosphere fully and evenly contact with the processed sample. Annealing furnace is a common equipment for growing large size two-dimensional graphene by CVD method. The temperature measuring element is directly in contact with the sample to ensure the accuracy of the sample temperature.