Equipment introduction：

Rotary pendulum PECVD system is suitable for thin film deposition on the surface of powder materials. The system is composed of high power RF power supply (500W, 13.56MHz), gas mass flow control system, vacuum system and rotary pendulum system. It adopts Nobardi operating software of NBD-101EP centralized bus control technology. Plasma properties are used to control or influence the process of gas reaction and chemical reaction on the material surface and to deposit thin films at appropriate temperatures. PECVD deposited films have excellent electrical properties, good substrate adhesion and excellent step coverage. Because of these advantages, it has a wide range of applications in VLSI, photoelectric devices, MEMS and other fields.