Equipment introduction:
Double temperature zone PECVD tubular furnace system, the components of 500W RF generator, positioning independent sliding sintering furnace, high precision mass flow mixing system, stable anti-oil vacuum system. The PECVD can be used to grow nanowires or to produce various thin films by CVD method.
Equipment introduction:
Double temperature zone PECVD tubular furnace system, the components of 500W RF generator, positioning independent sliding sintering furnace, high precision mass flow mixing system, stable anti-oil vacuum system. The PECVD can be used to grow nanowires or to produce various thin films by CVD method.