RTP（Rapid Thermal Processing Furnace）,patent product, rising speed rate up to 500℃/S. And at the end of the sintering process, the sample is taken out at high temperature directly, to achieve the fastest cooling in the physical state.
The chamber adopts a unique intake structure, The inner tube is gas inlet, the outer tube is gas outlet.This kind structure make reaction atmosphere expposed in the processing sample fully and constantly.
It is perfect helper for growing large-size two-dimensional graphene by CVD method.
Temperature measurement devices contact with the sample directly. it ensure the accuracy of the sample temperature.