NBD LABS ISRAEL PROFESSIONAL TOP SERVICE
NBD LABS ISRAEL PROFESSIONAL TOP SERVICE
NBD LABS ISRAEL PROFESSIONAL TOP SERVICE

PRODUCTS

CVD system T1700-XITG2Z

product introduction:

Chemical vapor deposition (CVD) refers to a method of chemical gas or steam reacting on the surface of a substrate to synthesize a coating or nanomaterial. It is the most widely used technology for depositing thin film materials in the semiconductor industry, including a wide range of insulating materials Most metal materials and metal alloy materials. To this end, we have developed a complete set of CVD coating systems, which are suitable for major universities, material laboratories, scientific research institutes, environmental protection science and other fields;

Configuration details

Model CVDT1700-50ITG2Z CVD T1700-60ITG2Z CVD T1700-80ITG2Z
Furnace tube size Φ50*1000mm Φ60*1000mm Φ80*1000mm
Operating temperature ≤1650℃
Heating zone size 310mm
Heating rate ≤20℃/min
Electrical Specifications AC 220V  4.5KW
Gas system (optional) Flowmeter type Float flowmeter Mass flowmeter
Pipeline schematic
Number of intake ports 2、3、4(Multiple options)
Flow range 20-250/20-800ml/min(Multi-range optional) 50/100/200sccm(Multi-range optional)
Working pressure range 0-0.15MPa
Low vacuum system (optional) Vacuum pump model NBD-1.5C NBD-3C NBD-4C
Pumping rate 1L/s 3L/s 4L/s
Inlet and exhaust port size Φ8mm Pagoda joint Φ8mm Pagoda joint KF16/25
Ultimate pressure 1000Pa 100Pa 10Pa
Ambient temperature 5-40℃
Electrical Specifications AC220V
High vacuum system (optional) Vacuum pump model NBD-103(A) NBD-103(B) NBD-103(C)
Pumping rate 110L/s 600L/s 700L/s
Vacuum gauge Compound vacuum gauge
Ultimate pressure 10^-3Pa 10^-4Pa 10^-5Pa
Ambient temperature 5-40℃
Electrical Specifications AC 220V AC 220V AC 380V