Chemical vapor deposition (CVD) refers to a method of chemical gas orsteam reacting on the surface of a substrate to synthesize a coating or nanomaterial. It is the most widely used technology for depositing thin film materials in the semiconductor industry, including a wide range of insulating materials Most metal materials and metal alloy materials. To this end, we have developed a complete set of CVD coating systems, which are suitable for major universities, material laboratories, scientific research institutes, environmental protection science and other fields.