NBD LABS ISRAEL PROFESSIONAL TOP SERVICE
NBD LABS ISRAEL PROFESSIONAL TOP SERVICE
NBD LABS ISRAEL PROFESSIONAL TOP SERVICE

PRODUCTS

CVD system O1200-XITD3F

product introduction:

         Chemical vapor deposition (CVD) refers to a method of chemical gas or steam reacting on the surface of a substrate to synthesize a coating or nanomaterial. It is the most widely used technology for depositing thin film materials in the semiconductor industry, including a wide range of insulating materials Most metal materials and metal alloy materials. To this end, we have developed a complete set of CVD coating systems, which are suitable for major universities, material laboratories, scientific research institutes, environmental protection science and other fields;

 Configuration details

Model NBD-O1200-XIT (furnace tube diameter 50, 60, 80, 100mm optional)
Operating temperature ≤1150℃
Heating zone size 440mm
Heating rate ≤20℃/s
Electrical Specifications AC 220V  4KW
Gas system (optional) Flowmeter type Float flowmeter Mass flowmeter
Pipeline schematic
Number of intake ports 2、3、4(Multiple options)
Flow range 20-250/20-800ml/min(Multi-range optional) 50/100/200sccm(Multi-range optional)
Working pressure range 0-0.15MPa
Low vacuum system (optional) Vacuum pump model NBD-1.5C NBD-3C NBD-4C
Pumping rate 1L/s 3L/s 4L/s
Inlet and exhaust port size Φ8mm Pagoda joint Φ8mm Pagoda joint KF16/25
Ultimate pressure 1000Pa 100Pa 10Pa
Ambient temperature 5-40℃
Electrical Specifications AC220V
High vacuum system (optional) Vacuum pump model NBD-103(A) NBD-103(B) NBD-103(C)
Pumping rate 110L/s 600L/s 700L/s
Vacuum gauge Compound vacuum gauge
Ultimate pressure 10^-3Pa 10^-4Pa 10^-5Pa
Ambient temperature 5-40℃
Electrical Specifications AC 220V AC 220V AC 380V
* Support non-calibration, more models, welcome to call 400-000-3746